Available Models

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Model No. Wafer Size Nominal Thickness Quantity
FTS Recertification 100 mm, 125 mm, 150 mm, 200 mm and 300 mm all values
FTS12-10100 300 mm 1010 nm
FTS12-6750 300 mm 675 nm
FTS12-4000 300 mm 400 nm
FTS12-2000 300 mm 200 nm
FTS12-1000 300 mm 100 nm
FTS12-500 300 mm 50 nm
FTS12-120 300 mm 12 nm
FTS12-250 300 mm 25 nm
FTS12-75 300 mm 7.5 nm
FTS12-45 300 mm 4.5 nm
FTS12-20 300 mm 2 nm
FTS8-10100 200 mm 1010 nm
FTS8-6750 200 mm 675 nm
FTS8-4000 200 mm 400 nm
FTS8-2000 200 mm 200 nm
FTS8-1000 200 mm 100 nm
FTS8-500 200 mm 50 nm
FTS8-250 200 mm 25 nm
FTS8-120 200 mm 12 nm
FTS8-75 200 mm 7.5 nm
FTS8-45 200 mm 4.5 nm
FTS8-20 200 mm 2 nm
FTS6-10100 150 mm 1010 nm
FTS6-6750 150 mm 675 nm
FTS6-4000 150 mm 400 nm
FTS6-2000 150 mm 200 nm
FTS6-1000 150 mm 100 nm
FTS6-500 150 mm 50 nm
FTS6-250 150 mm 25 nm
FTS6-120 150 mm 12 nm
FTS6-75 150 mm 7.5 nm
FTS6-45 150 mm 4.5 nm
FTS5-10100 125 mm 1010 nm
FTS5-6750 125 mm 675 nm
FTS5-4000 125 mm 400 nm
FTS5-2000 125 mm 200 nm
FTS5-1000 125 mm 100 nm
FTS5-500 125 mm 50 nm
FTS5-250 125 mm 25 nm
FTS5-120 125 mm 12 nm
FTS5-75 125 mm 7.5 nm
FTS5-45 125 mm 4.5 nm
FTS4-10100 100 mm 1010 nm
FTS4-6750 100 mm 675 nm
FTS4-4000 100 mm 400 nm
FTS4-2000 100 mm 200 nm
FTS4-1000 100 mm 100 nm
FTS4-500 100 mm 50 nm
FTS4-250 100 mm 25 nm
FTS4-120 100 mm 12 nm
FTS4-75 100 mm 7.5 nm
FTS4-45 100 mm 4.5 nm

Model Number Information for Silicon Dioxide Film Thickness
Film Thickness Standards are used to calibrate optical film thickness measurement instruments such as ellipsometers, reflectometers and spectrophotometers. The certified measurand is derived film thickness for fixed index of refraction 1.46 using a single layer, transparent, homogenous calculation model. Silicon Dioxide Film Thickness Standards are NIST traceable and NVLAP accredited under NVLAP Lab Code 200303-0.

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NVLAP Lab Code 200302-0