The Surface Topography Standard, shown at right, consists of an etched silicon dioxide "waffle pattern" on a silicon substrate.

STAY ON TOP OF 3D PROBE CALIBRATION. The Surface Topography Standard (STS) uses a combination of step height and pitch to enable three-dimensional calibration of optical interferometric microscopes and AFMs. Multiple pitch gratings take calibration further, allowing characterization of scan linearity. On high resolution tools such as the Atomic Force Microscope, NIST-traceable calibration can be achieved, driving your equipment to its full potential.

Product Description

The Surface Topography Standard consists of a 12 mm x 8 mm silicon die with a pitch cluster patterned in a layer of silicon dioxide. The pitch cluster contains three distinct grid patterns. Each grid pattern measures approximately 270 µm x 270 µm and consists of an array of alternating bars and spaces with an extremely uniform pitch in both the X and Y direction. Two models are available: the STS2 has pitches of 1.8 µm, 3 µm, and 5 µm; the STS3 has pitches of 3 µm, 10 µm, and 20 µm. Each model is available with vertical step heights of either 18 nm, 44 nm, 100 nm or 180 nm. Our precise manufacturing technique ensures a very regular topographic pattern, allowing accurate measurement across the entire working area of the standard. Each standard is accompanied by a Surface Topography Reference (STR) standard for daily monitor.

Product Specifications

  • Dimensions
    12 mm x 8 mm silicon die

  • Materials
    Silicon Dioxide on Silicon coated with Platinum (except STS2-1000S & STS2-1800S models)

  • Nominal Pitch Values (X and Y)
    STS2: 1.8 µm, 3 µm, and 5 µm (all on one standard)
    STS3: 3 µm, 10 µm, and 20 µm (all on one standard)

  • Nominal Height Values (Z)
    18 nm, 44 nm, 100 nm, 180 nm

  • Traceability
    NIST

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NVLAP Lab Code 200302-0