The Resistivity Standard, available in three wafer sizes, is shown in its matte finish. RESISTANCE NEED NOT BE FUTILE. Resistivity Standards (RS) span 4 decades and are designed for calibrating both contact and non-contact resistivity measuring instruments. The standard is created by sawing a doped single crystalline ingot into wafers, lapping and chemically cleaning them to VLSI Standards' specifications. Product Description Resistivity Standards are bare silicon wafers available in 3 in, 8 in and 12 in sizes. The silicon is p-type (Boron) doped to nominal resistivity values, from 0.002 ohm.cm to 75 ohm.cm as available on the 3" model. For enhanced measurement on contact probes, the wafers are lapped and chemically polished. The increased surface roughness allows cleaner penetration through the native oxide layer and better contact. Each wafer is certified at its center, NIST Traceable for accuracy. Certificates of Calibration are provided with each standard and report the resistivity, sheet resistance and thickness measurement values with calculated uncertainties. Product Specifications Wafer Size Resistivity [Ohm.cm] Sheet resistance [Ohms/Sq.] Thickness 76.2 mm 0.002 0.04 508 µm 76.2 mm 0.01 0.2 508 µm 76.2 mm 0.03 0.6 508 µm 76.2 mm 0.1 2 508 µm 76.2 mm 0.3 6 508 µm 76.2 mm 0.9 18 508 µm 76.2 mm 3 60 508 µm 76.2 mm 10 200 508 µm 76.2 mm 30 600 508 µm 76.2 mm 57 1100 508 µm 76.2 mm 75 1500 508 µm   200 mm 0.01 0.14 710 µm 200 mm 0.03 0.42 710 µm 200 mm 0.1 1.4 710 µm 200 mm 0.3 4.2 710 µm 200 mm 1 14 710 µm 200 mm 3 42 710 µm 200 mm 10 141 710 µm 200 mm 30 423 710 µm 200 mm 60 845 710 µm   300 mm 0.02 0.25 760 µm 300 mm 2.0 26 760 µm 300 mm 10 140 760 µm